IONIZED JET DEPOSITION ADVANTAGES

IJD has unique characteristics delivering distinct advantages for a variety of applications.

  1. STOICHIOMETRY CONSERVATION

    With appropriate conditions, IJD allows stoichiometry conservation just like a laser ablation system. This means that the same composition of the target is reproduced in the coating, allowing a relatively easy optimization of very complex materials like superconducting oxides (YBCO) or photoactive semiconductors (CIGS) that can be deposited in a single step.

  2. LOW TEMPERATURE PROCESSES

    IJD films produced in the right conditions exhibit good crystalline quality even if deposited at room temperature thanks to the high plasma density and excitation.

    This allow to coat delicate substrates like plastic or semiconductor devices.

  3. INDEPENDENT PARAMETERS

    IJD offers mostly independent process variables allowing to explore a wide set of energies and conditions and fine tune even the more complex deposition processes.

    The main parameters are: acceleration voltage, gas pressure, sample-target distance, pulse repetition rate.

  4. WIDE RANGE OF MATERIALS

    Thanks to strong interaction of electrons with materials IJD can work with virtually any solid material: conductive, non conductive, transparent, ultra-hard.

    Even high melting point metals or ultra hard oxides are feasible with excellent control and reproducibility.

  5. COMPETITIVE COST

    IJD equipment provides more power and flexibility at a fraction of the cost of a laser ablation system.

    The possibility to coat large objects using small targets (10-30 mm diameter, disc shaped) offers a great cost optimization opportunity in the development of coatings made of rare and precious materials.

  6. INDUSTRIAL

    Quality coatings, robustness, low cost and high deposition rate make IJD a good opportunity for industrial manufacturing. Contact us to discuss your application.

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