IJD is an effective solution for fast, efficient and controllable deposition of high melting point metals overcoming the limits of thermal and e-beam evaporators
IJD is a scalable technique for complex compound deposition where stoichiometry matters
Pulsed and highly energetic plasma is the key to obtain quality coatings in low thermal budget processes. IJD enables coating on a wide range plastics and delicate substrates.
Osseointegration facilitation in orthopeadic implants through IJD deposited coatings
R&D program at Verona University supported by CARITRO fundation to develop SnS solar cells by IJD technique