In a new publication by Czech Technical University the ionized jet deposition (IJD) method is applied to the preparation of thin films composed of refractory HfNbTiTaZr high-entropy alloy (HEA).
The results show that due to its stoichiometric reliability, the IJD method provides a flexible tool for deposition of complex multi-element materials, such as HEAs.
Skočdopole, J.; Čech, J.; Čapek, J.; Trojan, K.; Kalvoda, L.
Preparation of HfNbTiTaZr Thin Films by Ionized Jet Deposition Method. Crystals 2023, 13, 580. https://doi.org/10.3390/cryst13040580
Open-access publication: