The S201 is a small and affordable IJD deposition chamber perfect for thin film coating R&D or testing activities.
This chamber is designed with flexibility in mind and can be used as a bench-top system or mounted on a frame both in horizontal and vertical configuration.. With a basic setup is the ideal enrty-level system to discover the IJD capabilities. Can be easily expanded to a full featured R&D tool.
SPECIFICATIONS
Shape: cylindrical
IJD setup: standard 90° (vertical or horizontal)
Dimension: diameter 370 (ISO-K320), height 262 cm
Flanges: 1x KF16, 3x KF25, 2x CF40, 2x CF63, 1x ISO-K100
Viewport: 1x ISO-F 100
Door: 1x ISO-K 320
Material: 304L / 316L Stainless steel
The S200 chamber can be provided alone, partially or fully equipped according to user requirements with different IJD sources, sample, target holder, heaters, vacuum pump etc..
APPLICATIONS
R&D and process development for IJD based processes.
IJD can process a very wide range of materials for various applications in reactive or non-reactive mode:
- metals including high melting point metals
- oxides
- nitrides
- carbides
- superconductors
- semiconductors
- complex compounds in general
- polymers
See IJD in action in this video
For more information write at info@noivion.com or contact your local distributor.