IJD is emerging as cost-efficient and versatile thin-film fabrication technique for the fabrication of transition metal dichalcogenides thin films, such as molybdenum disulfide (MoS2).

We report a recent work [1] made at IMEM-CNR Institute of Materials for Electronics and Magnetism in Trento that demonstrated the deposition of homogenous and continuous films of stoichiometric MoS2 by IJD. This is paving the way for multiple applications solving well-known problems regarding the selenization process.

For more information on this process read the dedicated Application page or contact your local distributor or write to

[1] Ghiami, A.; Timpel, M.; Chiappini, A.; Nardi, M.V.; Verucchi (2020), R. Synthesis of MoS2 Thin Film by Ionized Jet Deposition: Role of Substrate and Working Parameters. Surfaces 2020, 3, 683-693.

We report a new very interesting work that is demonstrating polymer thin films made by IJD. CTU’s researchers successfully grown coatings made of PMMA, PS and PVC starting from bulk pieces of material:
Jakub Skočdopole, Ladislav Kalvoda, Petr Nozar, Miloš Netopilík
Preparation of polymeric coatings by ionized jet deposition method, Chemical Papers (2017),

Reducing of the thickness of a polymeric layer under a certain threshold gives rise to interesting properties, difficult to be predicted and fundamentally different from those of the bulk material. For this reason polymer thin films have attracted great interest in research and industry due to the large potential in solving different technological problems.

For more information on this application feel free to contact the author or write at

Researchers at Biomechanics Laboratory at Istituto Ortopedico Rizzoli used IJD stoichiomerty conservation capabilities in a very original way using properly treated animal bones as a starting material to produce bone apatite-like (BAL) coatings on orthopedic and dentistry implants.

The use of natural apatite allow to have a ideal composition including small amounts of elements that may be relevant in promoting osseointegration and would be very difficult to be
included in a laboratory synthesized target.

For more information:

We are glad to announce that the first IJD source model K1A has been installed at the Laboratory of Applied Photonics directed by doc. Ing. Ladislav Kalvoda, CSc. located in the Faculty of Nuclear Science and Physical Engineering at Czech Technical University in Prague.

The new source will be used in research activities with particoular focus in the following fields: adaptive layers highly resistant to mechanical loads and radiation exposure,  active layers of radiation detectors and solar cells, and “composition maps” applicable in high entropy alloys development.

The deposition chamber has been developed and installed by Czech Vacuum, Noivion’s representative for East Europe.

ASML Challenge Event

31th Jan 2017 Veldhoven, NL

Noivion is in the short list of about 10 startups in the hardware and semiconductor field selected within a group of 80 companies from all over the world by ASML to attend to the final event of the Get In the Ring challenge.

Noivion’s CEO Gianpiero Tedeschi on January 31st will present Ionized Jet Deposition at ASML headquarters in Veldhoven in a pitch event and one to one meetings to a number of ASML’s engineers and executives.

About ASML
Founded in 1984 with more than 14500 employees and €6.3bn of net sales ASML is one of the world’s leading manufacturers of chip-making equipment and pioneer in the EUV photolitography technology.

25th – 27th Oct 2016 Grenoble, FR
We are proud to announce that Noivion has been selected to participate to Semicon Europa – Innovation Village Oct 25-27 in Grenoble where best European emerging companies meet the semiconductor industry’s top strategic investors and leading technology partners.
Noivion’s CEO Gianpiero Tedeschi will present IJD technology on October 25th, at 15:00 during Equipment Session, Innovation Village Area, Alpexpo.
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