IJD is an effective solution for fast, efficient and controllable deposition of high melting point metals overcoming the limits of thermal and e-beam evaporators
IJD is a scalable technique for complex compound deposition where stoichiometry matters
Pulsed and highly energetic plasma is the key to obtain quality coatings in low thermal budget processes. IJD enables coating on a wide range plastics and delicate substrates.
Osseointegration facilitation in orthopeadic implants through IJD deposited coatings
R&D program at Verona University supported by CARITRO fundation to develop SnS solar cells by IJD technique
A modified version of the IJD source is able to generate consistent quantities of atomic oxygen.
A process for CdTe solar cells by PED and comparison with conventional methods developed at Verona University
Learn how IJD can be used to grow thin films made even by organic materials