a) NOIVITRON
Industrial deposition system for commercial production, equipped with two sets of five IJD guns for simultaneous dual-material coating or fast deposition of hybrid nanolayers.
b) Lab Jet 4.0
A turn-key fully equipped IJD coating system.
The perfect solution for scientific research and process development.
c) Atomic Oxygen Generator (AtOx)
A turn-key fully equipped system for atomic oxygen (AtOx) production.
d) K1A – IJD Source
Standalone IJD Source. For mounting on existing chambers and systems. CF40 mounting flange, direct gas feed, 90 deg target-source geometry make the K1A probably the most compact and advanced Pulsed Electron Deposition (PED) solution on the market.
e) Lab Jet 6.0
Mid sized chamber up to 3 IJD sources. Ideal for multi-material process development and research.
f) Lab Jet 8.0
Industrial coating chamber up to 5 IJD sources. Perfect for industrial pilot development and small scale industrial coating.
g) S200 – R&D deposition chamber
The S201 is a small and affordable IJD deposition chamber perfect for thin film coating R&D or testing activities.