Learn in this technical insights the similarities, differences and advantages of pulsed electron ablation techniques over light equivalent PLD
Transferring optoelectronic properties of 2D materials to a large-area thin film. A breakthrough towards the large-scale and affordable production of 2D-like materials.
IJD is emerging as cost-efficient and versatile thin-film fabrication technique for the fabrication of transition metal dichalcogenides thin films, such as MoS2.
Learn how IJD can be used to grow thin films made even by organic materials
IJD is an effective solution for fast, efficient and controllable deposition of high melting point metals overcoming the limits of thermal and e-beam evaporators
IJD allows to deposit complex compounds preserving stoichiometric composition in a single coating step..
Pulsed and highly energetic plasma is the key to obtain quality coatings in low thermal budget processes. IJD enables coating on a wide range plastics and delicate substrates.
Osseointegration facilitation with antimicrobial properties in orthopeadic implants through IJD deposited coatings.
R&D program at Verona University supported by CARITRO fundation to develop SnS solar cells by IJD technique
A modified version of the IJD source is able to generate consistent quantities of atomic oxygen.
Plasma generators - A compact 2,45 Mhz microwave plasma torch